PulsedLaserDeposition相关论文
在不同氧分压下,用脉冲激光沉积法在c-蓝宝石衬底上制备了高质量β-Ga2O3?δ薄膜.通过X-射线衍射、远红外反射光谱、X-射线光电子......
Preparation and Effect of Oxygen Annealing on the Electrical and Magnetic Properties of Epitaxial (0
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GeS6 chalcogenide amorphous film was deposited on glass substrate via PLD (pulsed laser deposition) technique. The perfo......
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Ce3+, Yb3+ co-doped Y3Al5O12 iflms were prepared by pulse laser deposition. X-ray diffraction, X-ray photoelectron spect......
CdS thin film was used as a suitable window layer for CdS/CdTe solar cell, and the properties of CdS thin films deposite......
Comprehensive Optimization of Electrical and Optical Properties for ATO Films Prepared by Pulsed Las
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Tribological properties of Tin moS2/Ag film deposited by PLD technique at elevated temperature to 90
In order to develop a lubricating film with excellent mechanical and tribological performance in wide temperature range,......
Rationalization and Mechanisms of Pulsed Laser Deposition of Fibroin Nanofilms by Using Autogenous B
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Pulsed laser plating is a new method to deposit hydroxyapatite(HA) thin films on various metallic substrates for biomate......
Highly Enhanced Long Time Stability of Perovskite Solar Cells by Involving a Hydrophobic Hole Modifi
Recently,much progress has been achieved in the lab prototype perovskite solar cells(PSCs),however,the challenging towar......
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YBa2Cu3O7-δ (YBCO) ceramic thin films were deposited by pulsed laser deposition on single crystal LaAlO3 (100) substrat......
Pulsed ultraviolet light from a XeF excimer laser was used to grow thin films of zinc oxide on(111)p-type silicon wafers......
Low-dimensional oxide structures have remarkable properties that can be tuned by external fields.Particularly,based on t......
Microwave Dielectric Properties of Nanaocrystalline Ba(ZrxTi1-x)O3 Thin Films Epitaxially Grown on(1
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Multiferroic properties of Bi0.85La0.15FeO3 thin film grown on LaNiO3/Pt/TiO2/Si substrate by PLD te
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Negative thermal expansion ZrW2O8 thin films have been grown on quartz substrates by pulsed laser deposition (PLD) metho......
Mutiferroic thin films with coupled ferroelectric and ferromagnetic order parameters have attracted tremendous interest ......
Anomalous positive magnetoresistance (MR) up to 36％ was observed at 2 K and 12 T in the undoped amorphous carbon (a-C) fi......
Indium selenide,as a group Ⅲ-Ⅳ semiconductor,is attracted much attention recently,due to its high photoresponsivity,in......
常用的硫化锌衬底增透膜系存在硬度低，保护效果差等问题，难以满足在恶劣环境使用的要求。在真空中用准分子激光制备了高红外透射率、......
纳米连接涉及纳-纳、纳-微-宏跨尺度的材料连接,其在微纳电子元器件及其系统、微纳光机电系统等互连封装制造和研发中起到越来越重......
以聚酰亚胺薄膜为靶子,用高电导硅作为衬底,KrF准分子激光器作为辐射光源,利用脉冲激光沉积技术制备出了类石墨薄膜,并以该薄膜为......
采用脉冲激光沉积法, 室温条件下在透明导电玻璃衬底上制备了Bi3.95Er0.05Ti3O12(BErT)薄膜。研究结果表明, 低沉积氧气压下制备的......
采用固相法烧结制备了Ag掺杂的La2/3Ca1/3MnO3(LCMO∶Agx，x为摩尔分数，x=0.00，0.05，0.10)多晶靶材，并利用此靶材采用脉冲激光沉积法(PLD......
钌酸盐是典型的ABO3型过渡金属氧化物, 具有金属导电性, 其薄膜可作为电极材料用于集成铁电等器件中。分析了BaRuO3的钙钛矿晶体结......
在不同激光重复频率下用脉冲激光沉积方法(PLD)在Si (111)衬底上生长了ZnO薄膜, 以325 nm He-Cd激光器为激发源获得了薄膜的荧光光......
为了研究不同退火氧压对铝掺杂氧化锌薄膜结晶质量和激光感生电压效应的影响，采用脉冲激光沉积法在蓝宝石(0001)单晶平衬底上制备了......
对于InGaZnO材料作为沟道半导体的薄膜晶体管柔性显示器件的研究倍受关注。将Ga2O3,In2O3,ZnO高纯度粉末按一定比例混合,经过研磨......
脉冲激光沉积技术是制备先进光学薄膜与纳米光学器件的重要手段和前沿领域,是国际研究的热点。介绍了脉冲激光沉积技术原理与特点......
利用脉冲激光法制备了ＺｎＯ：Ａｌ透明导电膜。通过对膜进行霍尔系数测量及ＳＥＭ、ＸＲＤ测试分析，详细研究了沉积时基片温度、氧分压强对膜的透光率和电阻......
Enhanced electrochemical properties of Sm0.2Ce0.8O1.9 film for SOFC electrolyte fabricated by pulsed
The cubic fluorite structure Sm0.2Ce0.8O1.9(SDC)film was fabricated by pulsed laser deposition(PLD)to be used as electro......
报导了在c-Al2O3衬底上用脉冲激光沉积法制备MoS2薄膜,并测试了其不同温度下的光响应。通过拉曼散射光谱和X射线衍射光谱证明了所......
